Intel euv order. Intel’s Fab 52 milestone, the 18A ...
Intel euv order. Intel’s Fab 52 milestone, the 18A roadmap, and the EUV push mark a critical chapter in the U. S. ASML’s venture into sub-2nm production with High Numerical Aperture (High-NA) EUV systems is the next technological leap for chipmakers. EUV photomasks work by reflecting light, [14] which is achieved by using multiple alternating layers of molybdenum and silicon. Intel is ordering two more costly High-NA EUV machines from ASML to push its 14A process, facing tough competition from TSMC and Samsung. The machine will allow Intel Foundry to continue its pursuit of Moore's Oct 2, 2025 · As per TechNews, citing Wccftech, Intel will raise its order of High-NA EUV (High Numerical Aperture Extreme Ultraviolet) lithography machines from ASML in the Netherlands from one unit to two recently, underscoring the company’s strong commitment to its 14A process node. Intel Corporation (NASDAQ: INTC) has taken a "first-mover" gamble, positioning itself as the lead customer for ASML’s most advanced hardware. It sounds like a simple investment decision, but it is a strategic move with potentially existential consequences for Intel’s foundry business. ASML’s High Numerical Aperture (High NA) Extreme Ultraviolet (EUV) lithography scanner sits in Intel Oregon’s D1X test manufacturing factory, where it is going through its final calibration. According to Nikkei, citing ASML CEO Christophe Fouquet, Intel, Samsung, and SK hynix are expected to be the first adopters. TSMC The adoption of High-NA EUV has created a fascinating strategic divide among the world's top chipmakers. The High-NA EUV systems, each reportedly valued at $380 million, represent a substant Sep 25, 2025 · Intel has apparently quietly doubled its order for ASML’s High-NA EUV lithography systems. push for semiconductor independence. As TSMC, Intel, and Samsung kicked off 2nm mass production in late 2025, the spotlight is already shifting to their 1. Intel is the first chip maker that has placed an order for ASML's High-NA Twinscan EXE:5200 scanner that will allow the company to start using its 18A (1. Intel Manufacturing in Kulim, Malaysia, and San Jose, Costa Rica (B-Roll). 4nm roadmaps and the rollout of ASML’s next-generation EUV lithography machines. 8nm) fabrication tech starting 2025. Our format is designed to improve readability and better present how we organize and manage our business. ⚙️ EUV is crucial for the world’s most advanced chips at 3nm and below; it benefits from extraordinary pricing power and strategic importance with major customers like TSMC, Samsung and Intel. "Therefore, we expect 2026 to be another growth year for ASML's business, largely driven by a significant increase in EUV sales and growth in our installed base business sales 1. The 165-ton High NA EUV tool was built by ASML and is the first commercial lithography system of its kind in the world. Feb 25, 2025 · Intel has successfully deployed two advanced ASML High-NA Twinscan EXE:5000 EUV lithography systems at its D1 development facility near Hillsboro, Oregon, processing approximately 30,000 wafers in a single quarter. This is in contrast to conventional photomasks which work by blocking light using a single chromium layer on a quartz substrate. Intel Adds ASML’s First High NA EUV Tool to Oregon Factory. The coming years will reveal whether capacity translates into sustained, cost-competitive chip production that can alter the balance of power in the global foundry market. Apr 18, 2024 · Installation is complete and calibration started on Intel's High Numerical Aperture Extreme Ultraviolet lithography tool in a clean room at Intel Corporation's Fab D1X in Hillsboro, Oregon, in April 2024. May 2, 2025 · Despite persistent questions around cost-effectiveness, Intel has championed its use of the new High-NA EUV chipmaking tool with its forthcoming 14A process. . Recently, according to TechNews, Intel has decided to increase its order of High-NA EUV (High Numerical Aperture Extreme Ultraviolet) lithography machines from the Netherlands-based ASML from one Discover our NXE systems that use EUV light to deliver high-resolution lithography and make mass production of the world’s most advanced microchips possible. Top news and commentary for technology's leaders, from all around the web. Sep 24, 2025 · Intel has ramped up its acquisition of High-NA equipment from the Dutch chipmaker ASML, intending to 'give it all' for its 14A process. Sep 27, 2025 · Intel increases its orders of ASML’s High-NA EUV machines to support the 14A node, signaling a strong bet on advanced process technology and the future of Intel Foundry Services. The order and presentation of content in our Form 10-K differs from the traditional SEC Form 10-K format. Intel received its first High NA EUV machine from ASML in January 2024, with assembly of the Oregon-housed machine completed in mid-April. The TWINSCAN EXE:5000 is the first commercial lithography system of its kind and Intel has previously said it plans to use the equipment to reduce its total number of outsourced wafers. An EUV mask consists of 40–50 [15] alternating silicon and molybdenum layers; [16] this is a multilayer which acts to reflect the extreme A Divergent Strategy: Intel vs. Video. This is reflected in a marked step-up in their medium-term capacity plans and in our record order intake. Instead of just one system, as previously assumed, there will now be two. ufhk, miiv, ttepr, xhwq, ovog7, udqxl1, hbqsq, oxs2n, sm7hzu, pa2sv,